| 摘要 |
A method of manufacturing a Zn system buffer layer using a reaction solution unlikely to become opaque white, including the steps of forming a fine particle layer of ZnS, Zn (S, O), and/or Zn (S, O, OH), mixing an aqueous solution (I) which includes a component (Z), an aqueous solution (II) which includes a component (S), and an aqueous solution (III) which includes a component (C) to obtain a mixed solution and mixing an aqueous solution (IV) which includes a component (N) in the mixed solution to prepare a reaction solution in which the concentration of the component (C) is 0.001 to 0.25M, concentration of the component (N) is 0.41 to 1.0M, and the pH before the start of reaction is 9.0 to 12.0, and, using the reaction solution, forming a Zn compound layer of Zn (S, 0) and/or Zn (S, O, OH) on the fine particle layer by a liquid phase method with a reaction temperature of 70 to 95°C. |
