System and method for generating extreme ultraviolet light, and laser apparatus

摘要

An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

主权项

1. An extreme ultraviolet light generation system used with a laser apparatus, the extreme ultraviolet light generation system comprising:
a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam; a magnetic field generation unit, provided to the chamber, for generating a magnetic field in which a charged particle emitted from the target material that has been struck by the laser beam is trapped; and a collection unit into which the trapped charged particle is collected, wherein the at least one polarization control unit converts the laser beam into a linearly polarized laser beam.