发明名称 |
METHOD OF FABRICATING OXIDE SUPERCONDUCTING FILM |
摘要 |
A laser beam (2) is applied to a target (1) of an oxide superconductive material, to deposit atoms and/or molecules which are scattered from the target (1) on a first portion (4) of a substrate (3) under an atmosphere containing oxygen for a start. Then, the substrate (3) is moved to deposit atoms and/or molecules scattered from the target (10) on a second portion, which is different form the first portion (4) of the substrate (3), under the atmosphere containing oxygen. At this time, the first portion (4) is subjected to oxygen annealing. These deposition steps are repeated until an oxide superconducting film of a desired thickness is obtained. |
申请公布号 |
EP0398164(A3) |
申请公布日期 |
1991.03.27 |
申请号 |
EP19900108847 |
申请日期 |
1990.05.10 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LIMITED |
发明人 |
OKUDA, SHIGERU, C/O OSAKA WORKS OF |
分类号 |
C04B41/87;C01B13/14;C01G1/00;C01G3/00;C01G29/00;C23C14/06;C23C14/08;C23C14/28;C23C14/58;H01B12/00;H01B12/06;H01B13/00;H01L39/24 |
主分类号 |
C04B41/87 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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