发明名称 Buffer layers on rolled nickel or copper as superconductor substrates
摘要 Buffer layer architectures are epitaxially deposited on biaxially-textured rolled substrates of nickel and/or copper and their alloys for high current conductors, and more particularly buffer layer architectures such as Y2O3/Ni, YSZ/Y2O3/Ni, Yb2O3/Ni, Yb2O3/Y2O3/Ni, Yb2O3/CeO2/Ni, RE2O3/Ni (RE=Rare Earth), and Yb2O3/YSZ/CeO2/Ni, Y2O3/Cu, YSZ/Y2O3/Cu, Yb2O3/Cu, Yb2O3/Y2O3/Cu, Yb2O3/CeO2/Cu, RE2O3/Cu, and Yb2O3/YSZ/CeO2/Cu. Deposition methods include physical vapor deposition techniques which include electron-beam evaporation, rf magnetron sputtering, pulsed laser deposition, thermal evaporation, and solution precursor approach, which includes chemical vapor deposition, combustion CVD, metal-organic decomposition, sol-gel processing, and plasma spray.
申请公布号 US6150034(A) 申请公布日期 2000.11.21
申请号 US19980096559 申请日期 1998.06.12
申请人 UT-BATTELLE, LLC 发明人 PARANTHAMAN, MARIAPPAN;LEE, DOMINIC F.;KROEGER, DONALD M.;GOYAL, AMIT
分类号 C23C14/08;C30B23/02;H01L39/24;(IPC1-7):B32B9/00 主分类号 C23C14/08
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