发明名称 PELLICLE AGING ESTIMATION AND PARTICLE REMOVAL FROM PELLICLE VIA ACOUSTIC WAVES
摘要 A pellicle is disposed over a lithography mask. An acoustic wave generator is placed over the pellicle. The acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency. A resonance detection tool is configured to detect an actual resonance frequency of the pellicle in response to the acoustic waves. One or more electronic processors are configured to estimate an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency.
申请公布号 US2016274471(A1) 申请公布日期 2016.09.22
申请号 US201514658399 申请日期 2015.03.16
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Lee Yu-Ching;Yu Ching-Fang;Lin Chun-Hung;Chin Sheng-Chi;Hsu Ting-Hao;Chang Mark
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. A system, comprising: a pellicle disposed over a lithography mask; an acoustic wave generator placed over the pellicle, wherein the acoustic wave generator is configured to generate acoustic waves to cause the pellicle to vibrate at a target resonance frequency; a resonance detection tool configured to detect an actual resonance frequency of the pellicle in response to the acoustic waves; and one or more electronic processors configured to estimate an age condition of the pellicle as a function of a shift of the actual resonance frequency from the target resonance frequency.
地址 Hsin-Chu TW