TARGET SUPPLY DEVICE AND EUV LIGHT GENERATION APPARATUS

摘要

A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas supply section for supplying the tank with gas. The gas supply section may include a booster which is connected to a gas line, boosts the gas supplied from the gas line, and outputs the boosted gas to the tank, a pressure sensor for measuring the pressure inside the tank, and a pressure controller which adjusts the pressure of the gas to be supplied to the tank on the basis of a measurement result from the pressure sensor.

主权项

1. A target supply device configured to supply a target material comprising:
a tank configured to store the target material; a nozzle connected to the tank and configured to output the target material; and a gas supply section configured to supply the tank with gas, the gas supply section comprising:
a booster connected to the gas line and configured to boost gas supplied from the gas line and supply the tank with the boosted gas;a pressure sensor configured to measure pressure inside the tank; anda pressure controller configured to adjust pressure of the gas to be supplied to the tank based on a measurement result from the pressure sensor.