发明名称 |
Process for producing an X-ray mask |
摘要 |
<p>an X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10<-><5>K<-><1> or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10<-><5>K<-><1> and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s. Basically a process for preparing the X-ray support film comprises the steps of forming a film on a substrate and sintering the film.</p> |
申请公布号 |
EP0310124(B1) |
申请公布日期 |
1997.03.19 |
申请号 |
EP19880116217 |
申请日期 |
1988.09.30 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KUSHIBIKI, NOBUO;KATO, HIDEO;MIYAKE, AKIRA;FUKUDA, YASUAKI |
分类号 |
G03F1/22;G03F7/20;(IPC1-7):G03F1/00 |
主分类号 |
G03F1/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|