发明名称 Process for producing an X-ray mask
摘要 <p>an X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10<-><5>K<-><1> or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1 x 10<-><5>K<-><1> and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s. Basically a process for preparing the X-ray support film comprises the steps of forming a film on a substrate and sintering the film.</p>
申请公布号 EP0310124(B1) 申请公布日期 1997.03.19
申请号 EP19880116217 申请日期 1988.09.30
申请人 CANON KABUSHIKI KAISHA 发明人 KUSHIBIKI, NOBUO;KATO, HIDEO;MIYAKE, AKIRA;FUKUDA, YASUAKI
分类号 G03F1/22;G03F7/20;(IPC1-7):G03F1/00 主分类号 G03F1/22
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