发明名称 OPTICAL MASK AND MANUFACTURING METHOD OF THIN FIRM TRANSISTOR ARRAY PANEL
摘要 <p>An optical mask and a method for manufacturing a thin film transistor array panel are provided to increase the view angle of an LCD(Liquid Crystal Display) device by implementing concave portions in a common electrode. A gate line is formed on a substrate(110). A semiconductor is formed on the gate line. Data lines(171) and drain electrodes(175) are formed on the semiconductor. A protecting layer(180) is formed on the data lines and drain electrodes. Contact holes(185) for exposing the drain electrodes are formed at the protecting layer. A transparent conductive layer is formed on the protecting layer. A photoresist pattern is formed on the transparent conductive layer. The transparent conductive layer is etched using the photoresist pattern as an etch protecting layer, thereby forming pixel electrodes. The photoresist pattern includes plural rectangles, horizontal units for connecting the rectangles, and vertical units across to the horizontal units.</p>
申请公布号 KR20080018661(A) 申请公布日期 2008.02.28
申请号 KR20060081129 申请日期 2006.08.25
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JAE HYUN;LEE, SEUNG KYU;YEO, YONG SUK
分类号 H01L21/027;G02F1/136 主分类号 H01L21/027
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