| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enables a resist pattern of proper configuration to be formed, and to provide a resist pattern forming method that uses the resist composition. <P>SOLUTION: The resist composition contains: a base component (A) which exhibits solubility which changes in an alkali developer under the action of an acid; an acid generator component (B) which generates an acid upon exposure, and a nitrogen-containing compound (D), wherein the nitrogen-containing organic compound (D) is an ammonium salt compound of which the anion is an anion, represented by one among formulae (d1-1) to (d1-3), wherein R<SP>5</SP>is a hydrocarbon group which may have a substituent; X''' is a 2-6C alkylene group, in which at least one H atom is substituted by an F atom; and Y''' and Z''' are each independently a 1-10C alkyl group, in which at least one H atom is substituted by an F atom. <P>COPYRIGHT: (C)2010,JPO&INPIT |
