发明名称 SCALY LOW CRYSTALLINE SILICA AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To obtain a scaly low crystalline silica harmless to a human body, excellent in reactivity on the surface useful as a filler for cosmetic, antiperspirant, pack agent, coating material or resin and for various carriers and to provide a method for producing the silica. SOLUTION: This scaly low crystalline silica has 0.001-1μm thickness, 10 ratio (aspect ratio) of the longest length of the scaly plate to the thickness, >=3 ratio of the shortest length of the scaly plate to the thickness, <10% measured value of crystal type free silicic acid by X-ray diffraction a nalysis and silanol group absorptions at 3,600-3,700 and 3,400-3,500 cm<-1> of IR spectrum. This method for producing the silica comprises dealkalizing an aqueous solution of a silicic acid to give a silica sol and subjecting the sol to hydrothermal treatment.
申请公布号 JPH1129317(A) 申请公布日期 1999.02.02
申请号 JP19970179120 申请日期 1997.06.20
申请人 DOUKAI KAGAKU KOGYO KK 发明人 TERASE KUNIHIKO;TANAKA MASAHARU;INOUE MAKI;ONO HIDEKAZU
分类号 C01B33/12;(IPC1-7):C01B33/12 主分类号 C01B33/12
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