发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor, in which a capacitance value of parasitic capacitance is reduced without decreasing driving capability of a transistor in a semiconductor device such as an active matrix display device, at low cost. <P>SOLUTION: An insulating layer other than a gate insulating layer is provided between a wire formed of the same material layer as a gate electrode of the transistor and a wire formed of the same material layer as a source electrode or a drain electrode. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010170108(A) |
申请公布日期 |
2010.08.05 |
申请号 |
JP20090281286 |
申请日期 |
2009.12.11 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
YAMAZAKI SHUNPEI |
分类号 |
G09F9/30;G02F1/1368;G02F1/167;G02F1/17;H01L21/28;H01L21/336;H01L21/768;H01L23/522;H01L29/786;H01L51/50;H05B33/14 |
主分类号 |
G09F9/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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