发明名称 |
MANUFACTURING METHOD OF PHASE CHANGE MEMORY DEVICE AND OPERATING METHOD THEREOF |
摘要 |
<p>A manufacturing method of phase change memory device and an operating method thereof are provided to improve a cell driving strength by parallel connecting a phase change resistor device to two diodes. A first dopant region(14a) is formed inside a silicone substrate(10). A first insulated layer(16) including a bottom electrode(18) is formed on the silicone substrate. A phase change layer(20a) and a top electrode are formed on a top of the first insulated layer. The phase change layer is contacted with the bottom electrode. A second dopant region(24) is formed inside the first dopant region by using the top electrode as an ion injection mask. The silicone substrate has a SOI(Silicone On Insulator) structure made of a first silicone layer, an insulated layer, and a second silicone layer.</p> |
申请公布号 |
KR100887058(B1) |
申请公布日期 |
2009.03.04 |
申请号 |
KR20070090559 |
申请日期 |
2007.09.06 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
KANG, HEE BOK;HONG, SUK KYOUNG |
分类号 |
H01L21/8247;H01L27/115 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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