CONDUCTIVE OXIDE AND MANUFACTURING METHOD THEREFOR AND OXIDE SEMICONDUCTOR FILM

摘要

PROBLEM TO BE SOLVED: To provide conductive oxide capable of providing an oxide semiconductor film having low cost, suitably used as a target of sputtering and having high physical properties, a manufacturing method therefor and the oxide semiconductor film.SOLUTION: Conductive oxide contains O and at least one kind of element M selected from a group consisting of In, Al, Zn and Mg and crystalline AlZnOas crystalline AlMOand further at least one kind of crystalline selected from a group consisting of crystalline InAlZnO(0≤m<1, 0≤q<1 and 0≤p≤3 m+q) and crystalline InO.SELECTED DRAWING: None