发明名称 GaN系半導体装置
摘要 PROBLEM TO BE SOLVED: To provide a GaN-based semiconductor device in which the resistance of a reverse parallel circuit of a field effect transistor and a Schottky barrier diode can be reduced.SOLUTION: In the GaN-based semiconductor device, a common electrode 25 serving as the drain electrode of an HFET (heterojunction field effect transistor) 1 and as the cathode of an SBD (Schottky barrier diode) 2 is extending in the width direction of a gate electrode 22 across both the HFET 1 and SBD 2. Consequently, in the HFET 1 in the on state, the region Z1 of electron flow spreads up to the region of the SBD 2 in the off state, and the electron flow flows up to the common electrode 25. When the HFET 1 is turned off and the SBD 2 is turned on, the region Z2 of electron flow spreads up to the region of the HFET 1, in the SBD 1 in the on state, and the electron flow flows from the common electrode 25 up to the anode 21.
申请公布号 JP5993632(B2) 申请公布日期 2016.09.14
申请号 JP20120147129 申请日期 2012.06.29
申请人 シャープ株式会社 发明人 有村 龍人;佐藤 純一;ジョン トワイナム
分类号 H01L27/095;H01L21/28;H01L21/338;H01L29/41;H01L29/778;H01L29/812 主分类号 H01L27/095
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