发明名称 Electronic device manufacturing method and sputtering method
摘要 An electronic device manufacturing method includes a first step of moving a substrate holder close to a first shield member and locating a first projecting portion formed on the first shield member and having a ring shape and a second projecting portion having a ring shape and formed on a second shield member installed on the surface of the substrate holder at the outer peripheral portion of a substrate at a position to engage with each other in a noncontact state, a second step of, after the first step, sputtering a target while maintaining the first projecting portion and the second projecting portion at the position to engage with each other in the noncontact state, and a third step of, after the second step, setting the first shield member in an open state and sputtering the target to perform deposition on the substrate.
申请公布号 US9472384(B2) 申请公布日期 2016.10.18
申请号 US201514753656 申请日期 2015.06.29
申请人 Canon Anelva Corporation 发明人 Yamaguchi Nobuo;Matsuo Kazuaki
分类号 C23C14/35;H01J37/34;C23C14/00;C23C14/34;C23C14/50;C23C14/56 主分类号 C23C14/35
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A shield member used in a vacuum container, which includes a target holder configured to hold a target and a substrate holder configured to connect an up-and-down mechanism capable of moving the substrate holder in a vertical direction and configured to have a substrate placement surface capable of having one substrate placed thereon, the shield member comprising: a first member capable of being arranged between the substrate holder and the target holder and configured to set, by an operation of a first rotation driving unit, a closed state in which the substrate holder is shielded from the target holder or an open state in which the substrate holder is opened to the target holder, wherein when the first member is inserted between the substrate holder and the target holder, the first member sets the closed state, and when the first member is retreated from between the substrate holder and the target holder, the first member sets the open state; and a second member which is arranged, in contact with the substrate placement surface, on a side of the substrate placement surface of the substrate holder and at both outer peripheral edge portions of the one substrate and is configured to have a ring shape capable of holding both outer peripheral edge portions, wherein a first concentric projecting portion, extending in a direction of the second member and having at least one ring shape, is formed in contact with a surface of the first member, and wherein a second concentric projecting portion, engaging with the first concentric projecting portion in a noncontact state at a position when the first member is inserted between the substrate holder and the target holder by the first rotation driving unit and the substrate holder is moved up by the up-and-down mechanism and the substrate holder comes close to the first member, and extending in a direction of the first member and having at least one ring shape, is formed on a surface of the second member.
地址 Kawasaki-shi JP