Vacuum system for immersion photolithography

摘要

A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.

主权项

1. A lithographic apparatus, comprising:
a projection device configured to project a radiation beam onto a substrate; and a system to extract multi-phase fluid from a part of the lithographic apparatus system, the system comprising:
a pump system configured to draw the fluid from the part,a separator configured to separate the fluid drawn from the part into gas and liquid phases, anda control system configured to control the pressure within the separator by regulating the gas and/or liquid therein.