| 摘要 |
PROBLEM TO BE SOLVED: To provide a dry etching method to suppress the generation of any physical damage at the time of finely working etching retardant materials containing transition metal as primary configuring elements. SOLUTION: Materials 1 to be etched containing transition metallic elements are exposed to gas-shaped substance 4 having at least one carboxyl group, and at least the exposed surface of the materials 1 to be etched is converted into carboxylate 5. The exposed surface of the materials 1 to be etched is irradiated with an energy beam 6, and the volatile elimination of the converted carboxylate 5 is carried out. COPYRIGHT: (C)2005,JPO&NCIPI
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