| 摘要 |
<p>Provided is a sputtering apparatus having improved service life, with suppressed local consumption at an end portion in the axis direction of a rotatable cylindrical target and with uniformized erosion region in the cylindrical target. The apparatus is provided with a pair of sputtering vapor sources (2) having rotatable cylindrical targets (13) and magnetic field generating members (14) arranged inside the targets, respectively; and a sputter power supply (3) for supplying the apparatus with discharge power by having the cylindrical targets (13) as cathodes. The cylindrical targets (13) are arranged so that the center axes are parallel to each other, and the magnetic field generating members (14) generate magnetic fields which pass the surfaces of the cylindrical target (13) and have magnetic lines attracting each other.</p> |
