发明名称 SUBSTRATE ADSORBING STAGE DEVICE
摘要 <p>Provided is a substrate adsorbing stage device which is highly effective in neutralizing a substrate, in which the consumption of an ionizer is suppressed to a minimum, and the running cost of which is low. A substrate adsorbing stage device (1) comprises a mounting portion having an air hole (14) having an opening (14a) in a mounting surface (11) for a substrate (P), a vacuum pump (30) for suctioning gas from the air hole (14), a blower (40) for spraying gas from the air hole (14), and an ionizer (50) for ionizing the sprayed gas. The substrate adsorbing stage device (1) sprays the gas from the blower (40) on the substrate (P) held by adsorption by the mounting surface (11) by suction by the vacuum pump (30) and thereby separates the substrate (P) from the mounting surface (11). In the substrate adsorbing stage device (1), the ionizer (50) is provided on the position of a common pipe (62) between the air hole (14) and a suctioning pipe (63) and a blast pipe (64). The substrate adsorbing stage device (1) further comprises an ionizer control unit (75) for activating the ionizer (50) in communication with the operating condition of the blower (40).</p>
申请公布号 WO2009013799(A1) 申请公布日期 2009.01.29
申请号 WO2007JP64379 申请日期 2007.07.20
申请人 HIRATA CORPORATION;TAKAO, EIJI 发明人 TAKAO, EIJI
分类号 H01L21/683;B65G49/06 主分类号 H01L21/683
代理机构 代理人
主权项
地址