PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR PRODUCING ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE

摘要

Provided is a pattern forming method comprising a step in which a film is formed using an actinic ray-sensitive or radiation-sensitive resin composition, a step in which the film is exposed, and a step in which the film is developed using a developer after exposure, and a positive pattern is formed. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P1) comprising at least a repeating unit (a) represented by general formula (1) as a repeating unit having a group that produces a polar group as a result of being decomposed by the action of an acid.