发明名称 ガス導入装置及び誘導結合プラズマ処理装置
摘要 The invention provides an installation structure which can greatly avoid head-caused bad conditions of ceramic parts used by a processing apparatus. A gas introducing apparatus (10A) possesses a hollow connector main body (121) and a fixing mechanism (122) fixing the hollow connector main body (121) to a first part wall (6A). The fixing mechanism (122) possesses a keeping piece (123) used for keeping the upper part flange (121a) of the hollow connector main body (121), a ring-shaped male thread (124) as a first fastening piece, a nut (125) as a second fastening piece and a liner (126) located on the upper surface of the first part wall (6A) and fixed to the periphery of the hollow connector main body (121). In heating, the nut (125) and the liner (126) are thermally expanded in opposite directions; the keeping piece (123) is used as a stress relaxation mechanism to relax the stress of the hollow connector main body (121).
申请公布号 JP5992288(B2) 申请公布日期 2016.09.14
申请号 JP20120227736 申请日期 2012.10.15
申请人 東京エレクトロン株式会社 发明人 邊見 篤;三枝 直也
分类号 H01L21/3065;C23C16/455;C23C16/507 主分类号 H01L21/3065
代理机构 代理人
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