Reflective photomask blanks and reflective photomasks

摘要

Reflective photomask blanks are provided. The reflective photomask blank includes a multi-layered reflection layer on a photomask substrate, a capping layer directly disposed on a top surface of the multi-layered reflection layer to include transition metal and silicon, a passivation layer disposed on a surface of the capping layer opposite to the multi-layered reflection layer, and a light absorption layer on the passivation layer.

主权项

1. A reflective photomask blank comprising:
a multi-layered reflection layer on a photomask substrate; a capping layer directly disposed on a top surface of the multi-layered reflection layer, the capping layer comprising at least one transition metal and silicon; a passivation layer disposed on a surface of the capping layer that is opposite the multi-layered reflection layer, wherein the passivation layer is configured to prevent oxygen atoms from being introduced into an interface between the multi-layered reflection layer and the capping layer; and a light absorption layer on the passivation layer.