| 摘要 |
A system and method are used to recycle gases in a lithography tool. A first chamber (202) includes an element that emits light based on a first gas (208). A second chamber (204) uses the emitted light to perform a process and includes the second gas (210). The first and second gases converge between the two chambers, and at least one of the gases is pumped to a storage device (318). From the storage device, at least one of the two gases is recycled either within the system or remote from the system and possibly reused within the system. A gaslock (206) can couple the first chamber to the second chamber. A gas source supplies a third gas (304) between the first and the second gas in the gaslock, such that the first gas is isolated from the second gas in the gaslock. The first, second, and/or third gas can be pumped to the storage device and routed to the recycling device. The first, second, and/or third gas can be recycled for reuse to form the emitting light.
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