| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a nonlinear element in which a thin film for use in the nonlinear element can be patterned in such a profile as the side face is substantially perpendicular to a substrate. SOLUTION: When a TFD 10 of lateral structure is manufactured, a resist mask 19 is formed on a tantalum film 13 and a thick first insulating film 17, and then the first insulating film 17 and the tantalum film 13 are subjected to dry etching. First etching is performed using first etching gas G1 having a relatively low ratio of a first gas component (SF<SB>6</SB>) and a relatively high ratio of a second gas component (O<SB>2</SB>), and then second etching is performed using second etching gas G2 having a relatively high ratio of the first gas component (SF<SB>6</SB>) and a relatively low ratio of the second gas component (O<SB>2</SB>). COPYRIGHT: (C)2007,JPO&INPIT |
