| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device to stably generate plasma by preventing a mode jump from being generated even if discharge conditions of high frequency power are changed. <P>SOLUTION: This plasma treatment device has a reflection suppressing means to suppress reflection of a surface wave from a wall part 101a by damping the surface wave propagating on the boundary surface of a dielectric window 109 and plasma and entering the wall part 101a of a treatment vessel 101. A damping means forming one element of the reflection suppressing means has the level difference part 109a of the dielectric window 109 which is projected from the dielectric window 109 supported by the treatment vessel 101, the peripheral fringe part (taper part) 109b of the dielectric window 109 having a taper shape, a resistor 202 adjoining to the peripheral fringe part 109b of the dielectric window 109 to damp the surface wave, and the wall part 101a of the treatment vessel 101 comprising the peripheral fringe part 109b of the dielectric window 109 and a metal conductor adjoining to the resistor 202. The reflection suppressing means has a cooling means 203 to cool the damping means. <P>COPYRIGHT: (C)2008,JPO&INPIT |
