发明名称 INTERCONNECT STRUCTURES WITH ENCASING CAP AND METHODS OF MAKING THEREOF
摘要 A method of making an interconnect comprising: providing an interconnect structure in a dielectric material, recessing the dielectric material such that a portion of the interconnect structure extends above an upper surface of the dielectric; and depositing an encasing cap over the extended portion of the interconnect structure.
申请公布号 US2008318415(A1) 申请公布日期 2008.12.25
申请号 US20080199407 申请日期 2008.08.27
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 WONG KWONG HON;HSU LOUIS C.;DALTON TIMOTHY J.;RADENS CARL;YANG CHIH-CHAO;CLEVENGER LAWRENCE A.;STANDAERT THEODORUS E.
分类号 H01L21/4763 主分类号 H01L21/4763
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