发明名称 SILICON SINGLE CRYSTAL PULLING METHOD
摘要 A silicon single crystal pulling method is provided to accurately control the diameter of the silicon single crystal and to obtain the silicon single crystal of the high quality. In the pulling process, the silicon single crystal is image-picked up by using the image pickup device. In the image image-picked up, the brightness distribution of the high brightness part which is generated in the interface of the silicon single crystal(15) and silicon solution(13) is measured at each scanning line of image. The surface location of the silicon solution and the solid-liquid interface location are detected. The diameter control of the silicon single crystal is controlled based on the meniscus height which is the difference of the solid-liquid interface location and the surface location.
申请公布号 KR20090023267(A) 申请公布日期 2009.03.04
申请号 KR20080085037 申请日期 2008.08.29
申请人 SUMCO CORPORATION 发明人 TAKANASHI KEIICHI
分类号 H01L21/20 主分类号 H01L21/20
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