发明名称 CYLINDRICAL TARGET MATERIAL AND METHOD FOR MANUFACTURING THE SAME, AND CYLINDRICAL SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a cylindrical ceramic target material, capable of cancelling a large strain having a circularity of 0.50 mm or more even when the strain is generated during cold isostatic press (CIP) molding and excellent in circularity and concentricity.SOLUTION: The method for manufacturing a cylindrical ceramic target material comprises: grinding one end surface 2 and other end surface 3 of a cylindrical ceramic sintered body 1 by a surface grinder 9; grinding the outer peripheral surface 4 by a cylindrical grinder; and grinding the inner peripheral surface 5 by an internal grinder. The grinding by the surface grinder 9 comprises: placing the cylindrical ceramic sintered body 1 so that the end surface 2 is upward on the table of the surface grinder 9; fixing the sintered body to the table after being controlled so that a variation in a distance from the surface of the table to the end surface 2 is within 0.80 mm,; and grinding the end surface 2.SELECTED DRAWING: Figure 1
申请公布号 JP2016089181(A) 申请公布日期 2016.05.23
申请号 JP20140220839 申请日期 2014.10.29
申请人 SUMITOMO METAL MINING CO LTD 发明人 OZAWA MAKOTO;ANDO ISAO
分类号 C23C14/34;B24B5/12;B24B5/50;B24B41/06 主分类号 C23C14/34
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