| 摘要 |
<p>PURPOSE: The cleaning solution of photomask is repetitively proceed the cleaning process for eliminating the foreign material caused in the light projecting board in which the buffer layer is formed. CONSTITUTION: The phase shifting mask in which the phase inversion pattern(110) is formed on the light projecting board(100) is prepared. The oxygen annealing process is proceed in the phase shifting mask and the buffer layer is formed on the exposing surface of the light projecting board and phase inversion pattern.</p> |
