| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for copper film formation convertible into a copper film excellent in storage stability and coating performance, and excellent in conductivity at a low temperature.SOLUTION: A composition for copper film formation uses (A) copper formate or its hydrate, (B1) a monoamine compound and (B2) a diamine compound as raw materials, and is formed by mixing, in terms of anhydride, the total amount of the component B1 and the component B2 in the range of 2.05 pts. mol to 10 pts. mol with the 1 pt. mol component A, on condition that the mol ratio {B2/(B1+B2)} of the component B2 to the total mol amount of the component B1 and the component B2 is in the range of 0.03-0.40, and by generating the reaction at 80°C or lower.SELECTED DRAWING: None |
