| 发明名称 |
Silicon containing block copolymers for direct self-assembly application |
| 摘要 |
The present invention relates to a novel diblock copolymer comprising a repeat unit (1) and a repeat unit (2), where R1 is hydrogen or C1-C4 alkyl, R2 is selected from a group chosen from hydrogen, C1-C4 alkyl, C1-C4 alkoxy and halide, R3 is selected from a group chosen from hydrogen, C1-C4 alkyl and C1-C4 fluoroalkyl, and R4, R5, R6, R7, R8, R9, R10, R11, and R12 are independently chosen from a C1-C4 alkyl and n=1-6.;;The invention also relates to a novel composition comprising the novel polymer and a solvent. The invention further relates to a process utilizing the novel composition for affecting directed self-assembly of the block copolymer. |
| 申请公布号 |
US9505945(B2) |
申请公布日期 |
2016.11.29 |
| 申请号 |
US201414527939 |
申请日期 |
2014.10.30 |
| 申请人 |
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. |
发明人 |
Wu Hengpeng;Yin Jian;Lin Guanyang;Kim JiHoon;Paunescu Margareta |
| 分类号 |
B05D3/02;B05D3/14;C08F299/04;C09D153/00;H01J37/32;C08F230/08;C08F8/42;C08F293/00;C08L53/00;G03F7/038;B82Y30/00 |
主分类号 |
B05D3/02 |
| 代理机构 |
|
代理人 |
Brustein Mitchell |
| 主权项 |
1. A composition for use in directed self-assembly comprising;
i) a block copolymer comprising a repeat unit of structure (1) and a repeat of structure (2), where R1 is hydrogen or C1-C4 alkyl, R2 is selected from a group chosen from hydrogen, C1-C4 alkyl, C1-C4 alkoxy and halide, R3 is selected from a group chosen from hydrogen, C1-C4 alkyl and C1-C4 fluoroalkyl, and R4, R5, R6, R7, R8, R9, R10, R11, and R12 are independently chosen from C1-C4 alkyl and n=1-6; and, ii) solvent. |
| 地址 |
Luxembourg LU |
