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发明名称
METHOD AND APPARATUS FOR HEAT TREATMENT OF SILICON OXIDE FILM
摘要
申请公布号
JPH0855846(A)
申请公布日期
1996.02.27
申请号
JP19940212031
申请日期
1994.08.11
申请人
SEMICONDUCTOR ENERGY LAB CO LTD
发明人
YAMAZAKI SHUNPEI;SAKAMA MITSUNORI;SATO TOMOHIKO;TERAMOTO SATOSHI;TAKEMURA YASUHIKO;SAKAI SHIGEFUMI
分类号
H01L21/324;H01L21/316;H01L21/336;H01L29/786;(IPC1-7):H01L21/316
主分类号
H01L21/324
代理机构
代理人
主权项
地址
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