| 发明名称 |
Electrically isolated released microstructures |
| 摘要 |
A single mask, low temperature reactive ion etching process for fabricating high aspect ratio, released single crystal microelectromechanical structures independently of crystal orientation.
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| 申请公布号 |
US5847454(A) |
申请公布日期 |
1998.12.08 |
| 申请号 |
US19940310336 |
申请日期 |
1994.09.22 |
| 申请人 |
CORNELL RESEARCH FOUNDCATTON, INC. |
发明人 |
SHAW, KEVIN A.;ZHANG, Z. LISA;MACDONALD, NOEL C. |
| 分类号 |
C23F4/00;B81B3/00;G01P15/08;G01P15/125;H01L21/302;H01L21/3065;H01L29/82;H01L29/84;(IPC1-7):H01L23/48;H01L23/52;B44C1/22 |
主分类号 |
C23F4/00 |
| 代理机构 |
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