EXPOSING APPARATUS OF A SEMICONDUCTOR SUBSTRATE

摘要

A semiconductor substrate exposing apparatus is provided to perform easily stably an exposure process regardless of the size of a guide frame by using a reticle stage capable of being shrunk or expanded corresponding to the guide frame. A semiconductor substrate exposing apparatus includes a light source unit(110), a reticle stage and a substrate stage. The reticle stage(140) is arranged on a first light progressing path. The reticle stage is capable of being shrunk or expanded according to the size of a pellicle, wherein the pellicle is attached to a reticle. The reticle stage is used for supporting the reticle. The substrate stage(170) is used for supporting a semiconductor substrate, so that the substrate is arranged on a second light progressing path.