EXPOSURE MASK

摘要

An exposure mask comprising open section, first and second lego sections is provided to give optimum distribution and arrangement of open cells of the lego sections and improve failure such as vertical bands generated during stitch shot application by comprising the first and second sections including light shield cells and open cells with constant variation of the cells in the middle area of the first and second sections. The exposure mask includes: an open section containing open cells; the first lego section which is located at left side of the open section and contains light shield cells and open cells; and the second lego section which is located at right side of the open section and contains light cells and open cells. The open cells of the first and the second sections are distributed in separate sections of a substrate for carrying out optimum stitch shot. Variation of the light shield cells and/or open cells is constantly maintained in the middle area of the first and the second sections. The light shield cells and the open cells are probably and irregularly arranged.