APPARATUS AND METHOD FOR FORMING SEMICONDUCTOR FILM AND LINE BODY FORMED WITH SEMICONDUCTOR FILM

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor film forming apparatus and semiconductor film forming method capable of circumferentially and uniformly forming a semiconductor film on a line body, and to provide a line body formed with a semiconductor film.

SOLUTION: The semiconductor film forming apparatus 1 comprises a reaction container 3 that has a cavity 3a therein in which high frequency for excitation supplied from outside resonates; a quartz tube 4 that is attached to the reaction container 3 in such a way that it passes through the inside of the cavity 3a and both ends thereof 4a, 4b project from the reaction container 3; and a plasma reaction unit 5 in the quartz tube 4 in which gas introduced into the quartz tube 4 is excited by the high frequency for excitation supplied in the cavity 3a, and a plasma P is generated. The line body 2 is disposed in the quartz tube 4 having the plasma reaction unit 5 in which the plasma is generated. Therefore, the semiconductor film is circumferentially and uniformly formed on the line body 2.

COPYRIGHT: (C)2008,JPO&INPIT