Apparatus for substrate treatment and method for operating the same

摘要

The present invention relates to a substrate treatment apparatus and method which perform heat treatment on a substrate, and can accurately measure the temperature of the substrate even at a low temperature. An embodiment of the present invention includes a process chamber that has a substrate treatment space, a heating housing that contains a plurality of heating lamps for generating radiant energy, a window that is placed between the heating housing and the process chamber to maintain the air-tightness of the process chamber and transmit the radiant energy to be transferred to a substrate, a first pyrometer that measures a wavelength generated at the substrate in the process chamber, and converts the wavelength into substrate measurement energy, a second pyrometer that measures a wavelength generated at the window, and converts the wavelength into window measurement energy; and a heating controller that compensates for the window measurement energy in the substrate measurement energy, thereby calculating the temperature of the substrate itself, and uses the calculated temperature of the substrate itself to control the heating lamps.

主权项

1. An apparatus for substrate treatment comprising:
a process chamber that has a substrate treatment space; a heating housing that contains a plurality of heating lamps for generating radiant energy; a window that is placed between the heating housing and the process chamber to maintain the air-tightness of the process chamber and transmit the radiant energy to be transferred to a substrate; a first pyrometer that measures a wavelength generated at the substrate in the process chamber, and converts the wavelength into substrate measurement energy, wherein the first pyrometer is disposed under the substrate; a second pyrometer that measures a wavelength generated at the window, and converts the wavelength into window measurement energy, wherein the second pyrometer is disposed above the window; and a heating controller that compensates for the window measurement energy in the substrate measurement energy, thereby calculating the temperature of the substrate itself, and uses the calculated temperature of the substrate itself to control the heating lamps, wherein when the substrate is heat treated at a low temperature less than 500° C., wherein the first pyrometer measures substrate measurement energy as radiant energy in a form of wavelengths greater than 4 μm radiated from the substrate subjected to the heat treatment at a temperature less than 500° C., and the second pyrometer measures window top surface self-energy as radiant energy in the form of wavelengths generated from a window top surface heated by wavelengths greater than 4 μm, and wherein the heating controller calculates a substrate self-temperature as a temperature of the substrate itself by subtracting the window top surface self-energy measured by the second pyrometer from the substrate measurement energy measured by the first pyrometer.