Exposure apparatus and device fabrication method

摘要

A liquid immersion exposure apparatus includes a projection system having a last optical element, a first member having a liquid supply port, a second member having a liquid recovery port, and a driving system which electromagnetically moves the first member, the second member, or both of the first and second members. A substrate is moved below and relative to the last optical element, the first member and the second member. A liquid supply from the liquid supply port and a liquid recovery from the liquid recovery port are performed to form a liquid immersion area on a portion of an upper surface of the substrate. The substrate is exposed with a beam through liquid in the liquid immersion area.

主权项

1. A liquid immersion exposure apparatus comprising:
a projection system having a last optical element; a first member having a liquid supply port; a second member having a liquid recovery port; and a driving system which electromagnetically moves the first member, the second member, or both of the first and second members, wherein a substrate is moved below and relative to the last optical element, the first member and the second member, a liquid supply from the liquid supply port and a liquid recovery from the liquid recovery port are performed to form a liquid immersion area on a portion of an upper surface of the substrate, and the substrate is exposed with a beam through liquid in the liquid immersion area.