Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus

摘要

The disclosure provides a polarization-influencing optical arrangement that includes a first retardation element and a second retardation element. The optical arrangement is configurable so that a polarization-influencing effect of the first retardation element corresponds to an effect of a first lambda/2 plate having a first fast axis of the birefringence and a polarization-influencing effect of the second retardation element corresponds to an effect of a second lambda/2 plate having a second fast axis of the birefringence. An angle between the first fast axis and the second fast axis is 45°±5°.

主权项

1. An optical arrangement, comprising:
a first retardation element comprising a first partial element comprising an optically positively uniaxial crystal material, and a second partial element comprising an optically negatively uniaxial crystal material; and a second retardation element comprising a third partial element comprising an optically positively uniaxial crystal material, and a fourth partial element comprising an optically negatively uniaxial crystal material, wherein:
the optical arrangement is configurable so that a polarization-influencing effect of the first retardation element corresponds to an effect of a first lambda/2 plate having a first fast axis of the birefringence and a polarization-influencing effect of the second retardation element corresponds to an effect of a second lambda/2 plate having a second fast axis of the birefringence;an angle between the first fast axis and the second fast axis is 45°±5°; andthe optical arrangement is a microlithographic optical arrangement.