发明名称 INHIBITOR COMPOSITION FOR RACKS WHEN USING CHROME FREE ETCHES IN A PLATING ON PLASTICS PROCESS
摘要 The invention relates to an aqueous inhibition composition for the inhibition of electrochemical metal plating on polymer surfaces, said inhibition composition comprising an inhibition agent selected from the group of compounds having at least one sulfur and at least one nitrogen atom as well as to a method for the inhibition of an insulated surface of a rack area. The inventive inhibition composition is capable to provide a solution for prohibiting unintended metallization on insulated areas of the racks when non-chromic etching is utilized for plating on plastics processes.
申请公布号 WO2016137943(A1) 申请公布日期 2016.09.01
申请号 WO2016US19057 申请日期 2016.02.23
申请人 ENTHONE, INC. 发明人 NOFFKE, Frank;KONIGSHOFEN, Andreas;FUHRMANN, Axel;WERNER, Christoph
分类号 C03C15/00;C25D5/00;C25D17/08 主分类号 C03C15/00
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