SUBSTRATE TRANSPORTING DEVICE, SUBSTRATE TREATING APPARATUS, AND SUBSTRATE TRANSPORTING METHOD

摘要

Disclosed is a substrate transporting device including a transport mechanism, a transport chamber, a first exhaust fan, and a controller. The transport mechanism is movable in parallel in a given direction. The transport chamber includes a first wall disposed on a first side of the given direction of the transport mechanism, and a plurality of transportation ports each used for moving the substrate between an exterior and an interior of the transport chamber. The first exhaust fan is disposed closer to the first wall than any of the transportation ports, and exhausts gas in the transport chamber outside the transport chamber. The controller performs control such that, when the transport mechanism moves toward the first wall in a first proximal area whose distance from the first wall is of a given value or less, an exhaust amount of the first exhaust fan is larger than that when the transport mechanism moves toward the first wall out of the first proximal area.

主权项

1. A substrate transporting device, comprising:
a transport mechanism that is movable in parallel in a given direction and transports a substrate; and a transport chamber that accommodates the transport mechanism, the transport chamber comprising:
a first wall disposed on a first side of the given direction of the transport mechanism; anda plurality of transportation ports each used for moving the substrate between an exterior and an interior of the transport chamber, the substrate transporting device further comprising: a first exhaust unit that is disposed closer to the first wall than any of the transportation ports, and exhausts gas in the transport chamber outside the transport chamber, and a controller that controls the transport mechanism and the first exhaust unit, wherein the controller performs control such that, when the transport mechanism moves toward the first wall in a first proximal area whose distance from the first wall is of a given value or less, an exhaust amount of the first exhaust unit is larger than that when the transport mechanism moves toward the first wall out of the first proximal area.