SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of immersion liquid is retained on the projection and in contact with an object supported on the object holder.
申请公布号
WO2016173779(A1)
申请公布日期
2016.11.03
申请号
WO2016EP56235
申请日期
2016.03.22
申请人
ASML NETHERLANDS B.V.
发明人
KRAMER, Gijs;RAVENSBERGEN, Simon, Karel;ROSET, Niek, Jacobus, Johannes;HENNUS, Pieter, Renaat, Maria