| 摘要 |
PROBLEM TO BE SOLVED: To improve a soaking property in a ceramic heater arranging a heater electrode on one surface of a ceramic sintered compact.SOLUTION: An electrostatic chuck heater 20 includes: a ceramic sintered compact 22 capable of adsorbing a wafer W to be applied to plasma processing to a wafer installing surface 22a; a cooling plate 30 arranged on a rear face of the ceramic sintered compact 22; and an adhesion layer 40 for sticking the ceramic sintered compact 22 to the cooling plate 30. A heater electrode 26 is put around a surface 22b opposite to the wafer installing surface 22a of the ceramic sintered compact 22. The heater electrode 26 is pressurized and joined to the ceramic sintered compact 22 in a state where a metal joining material is heated to a temperature not more than a liquidus temperature of the metal joining material. |
