发明名称 INSPECTION APPARATUS AND INSPECTION METHOD WITH ELECTRON BEAM, AND DEVICE MANUFACTURING METHOD COMPRISING THE INSPECTION APPARATUS
摘要 An electron beam inspecting apparatus is a map projection type and comprises a primary electro-optical system which molds an electron beam emitted from an electron gun into a rectangular form and irradiates the surface of a sample to be inspected with the molded electron beam, a secondary electro-optical system which converges secondary electrons emitted from the sample, a detector which converts the converged secondary electrons into an optical image via a fluorescent plate to focus them to a line sensor, and a controller which controls the charge transfer time to transfer a line image captured by a pixel array provided in the line sensor by interlocking with the transfer speed of stage which moves the sample.
申请公布号 WO02056332(A1) 申请公布日期 2002.07.18
申请号 WO2001JP09628 申请日期 2001.11.02
申请人 EBARA CORPORATION;KABUSHIKI KAISHA TOSHIBA 发明人 YAMAZAKI, YUICHIRO;WATANABE, KENJI;SOBUKAWA, HIROSI;NOJI, NOBUHARU;SATAKE, TOHRU;YOSHIKAWA, SHOJI;KARIMATA, TSUTOMU;NAKASUJI, MAMORU;HATAKEYAMA, MASAHIRO;MURAKAMI, TAKESHI;NAGAHAMA, ICHIROTA;NAGAI, TAKAMITSU;SUGIHARA, KAZUYOSHI
分类号 H01J37/22;H01J37/244;H01J37/28;(IPC1-7):H01J37/244;H01J21/29;H01L21/027;H01L21/66 主分类号 H01J37/22
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