METHOD OF FORMING A PATTERN OF AN ARRAY OF SHAPES INCLUDING A BLOCKED REGION

摘要

PURPOSE: A method for forming the patter of a feature array is provided to improve the reproducibility of patterns by applying a complex pattern induced from a second pattern to a plurality of feature parts. CONSTITUTION: A substrate(10) includes a hybrid substrate containing a bulk part and/or a silicon-on-insulator part. A bottom of anti-reflection coating(BARC) layer(15) includes an organic material containing a light absorbing material and a polymer material. A second photo-resist layer(20) is formed on the surface of the substrate or on the surface of the BARC layer. The second photo-resist layer is formed by a spin coating method. A first photo-resist layer(30) is formed on the surface of the second photo-resist layer.