| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of calibrating a heat treatment apparatus for use in the heat treatment of a multilayer substrate comprising a heating device. <P>SOLUTION: The heat treatment apparatus comprises a step S1 of providing a testing substrate having a different structure compared with a multilayer substrate; a step S3 of applying heat treatment to the testing substrate using a heat process parameter set and thereby forming a layer having thickness distribution on the testing substrate; a step S5 of comparing the thickness distribution with the predetermined thickness distribution of a calibration layer on the testing substrate; and a step S6 of correcting the heat process parameter set and correcting a heating device in such an adjusting manner that a difference between the thickness distribution and the predetermined thickness distribution is compensated. In this case, the predetermined thickness distribution of the calibration layer on the calibration testing substrate corresponds to the flat thickness distribution of a layer on the multilayed substrate obtained by the same predetermined process condition and a set. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
