2-DIMENSIONAL PATTERNING EMPLOYING TONE INVERTED GRAPHOEPITAXY

摘要

After formation of a template layer over a neutral polymer layer, a self-assembling block copolymer material is applied and self-assembled. The template layer includes a first linear portion, a second linear portion that is shorter than the first linear portion, and blocking template structures having a greater width than the second linear portion. The self-assembling block copolymer material is phase-separated into alternating lamellae in regions away from the widthwise-extending portion. The blocking template structures perturb, and cause termination of, the lamellae. A cavity parallel to the first and second linear portions and terminating in self-alignment to the blocking template structures is formed upon selective removal of a polymeric block component. The pattern of the cavity can be inverted and transferred into the material layer to form fins having different lengths.

主权项

1. A method of forming a patterned structure comprising:
providing a template layer over a substrate; patterning said template layer to form a patterned template layer over said substrate, said patterned template layer containing a first linear portion extending along a lengthwise direction and having a first length, a second linear portion that is parallel to said first linear portion and having a second length that is less than said first length and having a uniform width, and blocking template structures having a blocking template structure width that is greater than said uniform width; applying a block copolymer material over said substrate and on said patterned template layer, wherein said block copolymer material includes alternating chains of a first polymeric block and a second polymeric block, said first polymeric block including a chain of a first polymeric block component and a second polymeric block including a chain of a second polymeric block component; inducing self-assembly of polymeric block components within said block copolymer material employing said patterned template layer as a template for alignment, wherein a polymeric block component portion parallel to said first and second linear portions, having a third length that is less than said second length, and having another uniform width is formed between a pair of blocking template structures among said blocking template; and removing said first polymeric block component selective to said second polymeric block component, wherein a trench pattern defined by trenches embedded within said second polymeric block component is formed.