METHOD FOR MANUFACTURING BURIED PATTERN USING SPACER PATTERING

摘要

PURPOSE: A method for manufacturing buried pattern using spacer pattering is provided to easily form a pattern having a curved structure by forming a buried pattern having pad regions which are crossed with each other. CONSTITUTION: A spacer(28) has a first sacrifice opening(29) which is defined as a pad region at either side on a first film. A second film pattern has a second sacrifice opening(33) which is defined at either side of a second film by etching the second film through a pad mask. The substrate is etched by using the first film as a etch barrier to form a trench. A buried pattern is buried at the trench.