PROJECTION OPTICAL DEVICE, EXPOSURE METHOD AND ALIGNER, PHOTOMASK AND DEVICE AND PHOTOMASK MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To perform pattern transfer appropriately by connecting a projected image by each projection optical system precisely when forming an enlarged image of a mask pattern on an object by a plurality of projection optical systems.

SOLUTION: A projection optical device comprises: a first projection optical system PL1 guiding luminous flux from a point (a) on a mask MA to a point A on a plate PT and forming an enlarged image of the mask MA on the plate PT; and a second projection optical system PL2 guiding luminous flux from a point (b) on the mask MA to a point B on the plate PT and forming an enlarged image of the mask MA on the plate PT. A first segment connecting an orthogonal projection point (a') onto the plate PT at the point (a) to the point A is overlapped to a second segment connecting an orthogonal projection point (b') onto the plate PT at the point (b) to the point B by viewing from a non-scanning direction.

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