| 摘要 |
A multicyclic compound for forming a photoreactive polymer is provided to realize excellent thermal stability and improved photoreaction rate and surface strength. A multicyclic compound for forming a photoreactive polymer is represented by the following formula 1. In formula 1, p is an integer of 0-4; at least one of R1, R2, R3 and R4 is a radical selected from the group consisting of the radicals represented by the formulae 1a, 1b and 1c; and the others each are selected from the group consisting of H, halogen, substituted or non-substituted C1-C20 alkyl, substituted or non-substituted C2-C20 alkenyl, substituted or non-substituted C5-C12 saturated or unsaturated cycloalkyl, saturated or unsaturated C6-C40 aryl, saturated or unsaturated C7-C15 aralkyl, saturated or unsaturated C2-C20 alkynyl and a non-hydrocarbonaceous polar group containing at least one element selected from O, N, P, S, Si and B, wherein R1 and R2, or R3 and R4 are optionally bonded to each other to form a C1-C10 alkylidene group, or R1 or R2 is optionally bonded to any one of R3 and R4 to form a C4-C12 saturated or unsaturated ring or C6-C24 aromatic ring.
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